Structure of chemical vapor deposition titania/silica gel

被引:71
作者
Leboda, R [1 ]
Gun'ko, VM
Marciniak, M
Malygin, AA
Malkin, AA
Grzegorczyk, W
Trznadel, BJ
Pakhlov, EM
Voronin, EF
机构
[1] Marie Curie Sklodowska Univ, Fac Chem, PL-20031 Lublin, Poland
[2] Inst Surface Chem, UA-252022 Kiev, Ukraine
[3] St Petersburg State Inst Technol Tech Univ, St Petersburg 9803, Russia
[4] Mil Inst Chem & Radiometry, PL-00910 Warsaw, Poland
关键词
silica gel; chemical vapor deposition titania; porosity parameters; globular model; fractal dimensions; infrared; non-uniform coverage; theoretical modeling;
D O I
10.1006/jcis.1999.6411
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The structure of porous silica gel/titania synthesized using chemical vapor deposition (CVD) of titania via repeated reactions of TiCl4 with the surface and subsequent hydrolysis of residual Ti-CI bonds at different temperatures was investigated by means of low-temperature nitrogen adsorption-desorption, X-ray diffraction (XRD), IR spectroscopy, and theoretical methods. A globular model of porous solids with corpuscular structure was applied to estimate the porosity parameters of titania/silica gel adsorbents. The utilization of this model is useful, for example, to predict conditions for synthesis of titania/silica with a specified structure. Analysis of pore parameters and fractal dimension suggests that the porosity and fractality of samples decrease with increasing amount of TiO2 covering the silica gel surface in a nonuniform layer, which represents small particles embedded in pores and larger particles formed at the outer surface of silica globules. Theoretical simulation shows that the Si-O-Ti linkages between the cover and the substrate can be easily hydrolyzed, which is in agreement with the IR data corresponding to the absence of a band at 950 cm(-1) (characteristic of Si-O-Ti bridges) independent of the concentration of CVD-titania. (C) 1999 Academic Press.
引用
收藏
页码:23 / 39
页数:17
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