In situ characterization of atomic layer deposition processes by a mass spectrometer

被引：27

作者：

Ritala, M

Juppo, M

Kukli, K

Rahtu, A

Leskelä, M

机构：

[1] Univ Helsinki, Inorgan Chem Lab, FIN-00014 Helsinki, Finland

[2] Tartu State Univ, Inst Expt Phys & Technol, EE-51010 Tartu, Estonia

来源：

JOURNAL DE PHYSIQUE IV | 1999年 / 9卷 / P8期

关键词：

D O I：

10.1051/jp4:19998127

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

In situ characterization of the chemical reactions in atomic layer deposition (ALD) processes in flow-type reactors is an important and challenging task. For this purpose, a quadrupole mass spectrometer has been integrated to an ALD reactor. The special features of this setup are described and its performance is demonstrated by studies on ALD oxide processes employing Al(CH3)(3), Ti(OC2H5)(4), Ta(OC2H5)(5) and Nb(OC2H5)(5) as metal precursors and water as the oxygen source.

引用

收藏

页码：1021 / 1028

页数：8

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