Bonding characterization of BC2N thin films

被引：181

作者：

Watanabe, MO

Itoh, S

Mizushima, K

Sasaki, T

机构：

[1] TOSHIBA CO LTD,ADV RES LAB,SAIWAI KU,KAWASAKI,KANAGAWA 210,JAPAN

[2] NATL INST RES INORGAN MAT,TSUKUBA,IBARAKI 305,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1996年 / 68卷 / 21期

关键词：

D O I：

10.1063/1.116369

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have studied the bonding states of BC2N thin films prepared by chemical vapor deposition? one of the new layered BCN compounds. The chemical bonding states of boron, carbon, and nitrogen atoms in the BC2N thin films were investigated by using x-ray photoelectron spectroscopy to measure chemical shifts of Is electrons, being compared with those in graphite and hexagonal (h-) BN. The results exhibited that the thin films had significant B-C and C-N bonds and were clearly different from graphite and h-BN, indicating that an atomic-level hybrid of the three elements was synthesized. (C) 1996 American Institute of Physics.

引用

页码：2962 / 2964

页数：3

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