FILAMENT ACTIVATED CHEMICAL-VAPOR-DEPOSITION OF BORON-CARBIDE COATINGS

被引：60

作者：

DESHPANDE, SV ^{[1
]}

GULARI, E ^{[1
]}

HARRIS, SJ ^{[1
]}

WEINER, AM ^{[1
]}

机构：

[1] GM CORP,CTR RES & DEV,WARREN,MI 48090

来源：

APPLIED PHYSICS LETTERS | 1994年 / 65卷 / 14期

关键词：

D O I：

10.1063/1.112909

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In this study, we have demonstrated that boron carbide, an extremely hard and wear-resistant material, can be deposited with hot filament-activated chemical vapor deposition (HFCVD). There are several benefits to using a hot filament system, including a high deposition rate and a relatively low substrate temperature with a process that is not line-of-sight. High purity, apparently amorphous boron carbide films were obtained by the use of a chlorine based precursor (which is less toxic than diborane). This indicates that either the hot filament helps in complete decomposition of BCI3 or the presence of high concentration of atomic hydrogen in a HFCVD environment helps in scavenging the chlorine. (C) 1994 American Institute of Physics.

引用

页码：1757 / 1759

页数：3

共 17 条

[1] LOW-PRESSURE, METASTABLE GROWTH OF DIAMOND AND DIAMONDLIKE PHASES [J].