Controlled fabrication of hollow metal pillar arrays using colloidal masks

被引：31

作者：

Jang, Se Gyu

yu, Hng Kyun Yu

Choi, Dae-Geun

Yang, Seung-Man ^{[1
]}

机构：

[1] Korea Adv Inst Sci & Technol, Natl Ctr Integrated Optofluid Syst, Taejon 305701, South Korea

[2] Korea Adv Inst Sci & Technol, Dept Chem & Biomol Engn, Taejon 305701, South Korea

[3] Korea Inst Machinery & Mat, Nanomech Syst Res Ctr, Taejon 305343, South Korea

来源：

CHEMISTRY OF MATERIALS | 2006年 / 18卷 / 26期

关键词：

D O I：

10.1021/cm060731j

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A novel method for fabricating a 2D hollow nanopiller array using reactive ion etching (RIE) through colloid arrays self-organized over a polymeric film, is proposed. Hollow nanopiller arrays of gold and molybdenum can be created directly on substrate over large areas without a pattern transfer process. The geometric features of nanopiller can be controlled by simply adjusting the polymer film thickness, and the RIE and the metal-sputtering conditions. This approach offers reproducibility on diverse substrates, simplicity of process, and feasibility for morphological control of nanopiller arrays. As prepared molybdenum hollow nanopiller arrays have exhibited a low turn-on voltage and can be applied for field-emission-related devices. The flexibility in controlling the hollow nanotube morphology is of practical significance in optics and biotechnology.

引用

收藏

页码：6103 / 6105

页数：3

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