Comparative study of the GaAs (113), (115), (001), ((1)over-bar(1)over-bar(5)over-bar), ((1)over-bar(1)over-bar(3)over-bar), and (110) surfaces by atomic force microscopy, low energy electron diffraction, and reflectance anisotropy spectroscopy

被引:11
作者
Pristovsek, M [1 ]
Menhal, H [1 ]
Schmidtling, T [1 ]
Esser, N [1 ]
Richter, W [1 ]
机构
[1] Tech Univ Berlin, Inst Festkorperphys, D-10623 Berlin, Germany
关键词
atomic force microscopy; reflectance anisotropy spectroscopy; low energy electron diffraction; metal-organic vapour phase epitaxy;
D O I
10.1016/S0026-2692(98)00151-7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have performed growth and surface studies using atomic force microscopy (AFM), reflectance anisotropy spectroscopy (RAS), and low energy electron diffraction (LEED) on GaAs (113), (115), (001), ((115) over bar), ((113) over bar), and (110) surfaces in metal-organic vapour phase epitaxy (MOVPE). All surfaces except (115), exhibited at least two different reconstructions depending on the arsenic coverage. The (113) surface showed a growth condition dependent corrugation, while the (001), ((113) over bar), and (110) surfaces have a flat surface with monoatomic steps. The ((115) over bar), and (115) exhibit islands. The activation energies and the reaction orders for the transition between different reconstructions were determined for the GaAs (110), (113), and (115) surfaces by fitting RAS transients obtained during arsenic desorption at different temperatures. In all cases we found a second-order time dependence proportional to l/kt with an activation energy of (2.4 +/- 0.3) eV for (110), (1.50 +/- 0.02) eV for (113), and (2.09 +/- 0.09) eV for (115) surfaces. (C) 1999 Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:449 / 453
页数:5
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