Microstructure of 5 keV gold-implanted polydimethylsiloxane

被引：24

作者：

Niklaus, Muhamed ^{[1
]}

Rosset, Samuel ^{[1
]}

Dadras, Massoud ^{[2
]}

Dubois, Phillipe ^{[1
]}

Shea, Herbert ^{[1
]}

机构：

[1] Ecole Polytech Fed Lausanne, LMTS, CH-2002 Neuchatel, Switzerland

[2] Univ Neuchatel, Inst Microtechnol, CH-2000 Neuchatel, Switzerland

来源：

SCRIPTA MATERIALIA | 2008年 / 59卷 / 08期

基金：

瑞士国家科学基金会;

关键词：

metal ion implantation; EAP; PDMS; elasticity of nanocomposites; gold clusters;

D O I：

10.1016/j.scriptamat.2008.06.038

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The first high-resolution transmission electron microscopy (TEM) cross-section images of flexible electrodes fabricated by gold ion implantation at 5 keV into polydimethylsiloxane (PDMS) are presented. A TEM sample preparation method based on cryo-ultramicrotomy, adapted for extremely low-modulus (1 MPa) elastomers, was developed, allowing the gold nanoparticles in a PDMS matrix to be imaged. The cluster size, size distribution and implantation depth of 50 nm were determined from the images and used to calculate the Young's modulus of the implanted layer. (c) 2008 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

引用

页码：893 / 896

页数：4

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