High-Quality ZnO Nanowire Arrays Directly Fabricated from Photoresists

被引：76

作者：

Cheng, Chun ^{[1
,2
]}

Lei, Ming ^{[1
,2
]}

Feng, Lin ^{[1
,2
]}

Wong, Tai Lun ^{[1
,2
]}

Ho, K. M. ^{[1
,2
]}

Fung, Kwok Kwong ^{[1
,2
]}

Loy, Michael M. T. ^{[1
,2
]}

Yu, Dapeng ^{[3
]}

Wang, Ning ^{[1
,2
]}

机构：

[1] Hong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R China

[2] Hong Kong Univ Sci & Technol, Inst Nano Sci & Technol, Hong Kong, Hong Kong, Peoples R China

[3] Peking Univ, Dept Phys, Beijing 100871, Peoples R China

来源：

ACS NANO | 2009年 / 3卷 / 01期

关键词：

zinc oxide; nanowire array; pattern; photoresist; antireflection; graphite; PATTERNED GROWTH; NANOROD ARRAYS; FILMS; NANOSTRUCTURES; ROUTE;

D O I：

10.1021/nn800527m

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Were port a simple and effective method for fabricating and patterning high-quality ZnO nanowire arrays using carbonized photoresists to control the nucleation site, density, and growth direction of the nanowires. The ZnO nanowires fabricated using this method show excellent alignment, crystal quality, and optical properties that are independent of the substrates. The carbonized photoresists provide perfect nucleation sites for the growth of aligned ZnO nanowires and they also perfectly connect to the nanowires to form ideal electrodes that can be used in many applications of ZnO nanomaterials.

引用

页码：53 / 58

页数：6

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