Hexamethyldisiloxane film as the bottom antireflective coating layer for ArF excimer laser lithography

被引：12

作者：

Chen, HL ^{[1
]}

Wang, LA ^{[1
]}

机构：

[1] Natl Taiwan Univ, Inst Electroopt Engn, Taipei 10764, Taiwan

来源：

APPLIED OPTICS | 1999年 / 38卷 / 22期

关键词：

D O I：

10.1364/AO.38.004885

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We demonstrate a new bottom antireflective coating (BARC) layer for ArF excimer laser lithography. The antireflective layer is composed of hexamethyldisiloxane (HMDSO) him, which is deposited by the conventional electron cyclotron resonance-plasma-enhanced chemical-vapor deposition process. We obtain the appropriate HMDSO films for BARC layers by varying the gas-flow rate ratio of oxygen to HMDSO. Such a process has several advantages: high deposition rate, low process temperature, easy film removal, and reduced cost. Measured reflectances of less than 0.5% on both Al-Si and silicon crystal substrates have been achieved and agree well with the simulated reflectances. The swine effect is shown to be significantly reduced by addition of the HMDSO-based BARC layer. (C) 1999 Optical Society of America.

引用

页码：4885 / 4890

页数：6

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