LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION METHOD UTILIZING AN ELECTRON-CYCLOTRON RESONANCE PLASMA

被引：343

作者：

MATSUO, S

KIUCHI, M

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1983年 / 22卷 / 04期

关键词：

D O I：

10.1143/JJAP.22.L210

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：L210 / L212

页数：3

相关论文

共 10 条

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