REACTIVE PLASMA DEPOSITED SI-N FILMS FOR MOS-LSI PASSIVATION

被引：229

作者：

SINHA, AK

LEVINSTEIN, HJ

SMITH, TE

QUINTANA, G

HASZKO, SE

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 04期

关键词：

D O I：

10.1149/1.2131509

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：601 / 608

页数：8

相关论文

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