CHARACTERIZATION OF PLASMA-DEPOSITED SILICON DIOXIDE

被引：173

作者：

ADAMS, AC

ALEXANDER, FB

CAPIO, CD

SMITH, TE

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 07期

关键词：

D O I：

10.1149/1.2127680

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：1545 / 1551

页数：7

相关论文

共 28 条

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