THE GROWTH AND CHARACTERIZATION OF VERY THIN SILICON DIOXIDE FILMS

被引：72

作者：

ADAMS, AC

SMITH, TE

CHANG, CC

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 08期

关键词：

D O I：

10.1149/1.2130002

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：1787 / 1794

页数：8

相关论文

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