CHEMICAL-DEPOSITION OF BORON-NITROGEN FILMS

被引：91

作者：

ADAMS, AC

CAPIO, CD

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 02期

关键词：

D O I：

10.1149/1.2129678

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：399 / 405

页数：7

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[1] EVALUATION OF THE PRISM COUPLER FOR MEASURING THE THICKNESS AND REFRACTIVE-INDEX OF DIELECTRIC FILMS ON SILICON SUBSTRATES
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