Optical materials and coatings at 157 nm

被引：29

作者：

Bloomstein, TM ^{[1
]}

Liberman, V ^{[1
]}

Rothschild, M ^{[1
]}

Hardy, DE ^{[1
]}

Goodman, RB ^{[1
]}

机构：

[1] MIT, Lincoln Lab, Lexington, MA 02420 USA

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2 | 1999年 / 3676卷

关键词：

D O I：

10.1117/12.351106

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

We update previously reported results on the absorption of optical materials and coatings for use in 157 nm based optical projection systems. New results include the transmission spectrum of a modified form of fused silica with suitable initial transmission for use as a mask substrate. We also report on a more systematic study of the effects of surface contaminants on optical components at 157 nm. We have modified our vacuum spectrometer to allow in-situ cleaning to enable a closer examination of purging requirements and cleaning procedures.

引用

页码：342 / 349

页数：6

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