Evolution of grain structure in thin film reactions

被引：19

作者：

Barmak, K ^{[1
]}

Rickman, JM ^{[1
]}

Michaelsen, C ^{[1
]}

机构：

[1] GKSS FORSCHUNGSZENTRUM GEESTHACHT GMBH,MAT RES INST,D-21502 GEESTHACHT,GERMANY

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1997年 / 26卷 / 09期

基金：

美国国家科学基金会;

关键词：

grain structure; microstructure; niobium/aluminum; polycrystalline; thin film reactions; thin films; titanium/aluminum;

D O I：

10.1007/s11664-997-0238-x

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this paper, we examine, both experimentally and theoretically, the kinetics of formation and microstructure of product phases in thin film reactions, using the Nb/Al and Ti/Al systems as our prototypes. The results of calorimetry and microscopy studies are interpreted using simple kinetic and morphology models. In particular, the kinetic models employed here focus on the nucleation and growth components of the phase formation process and the morphology models provide a starting point for the classification of product grain structures.

引用

页码：1009 / 1020

页数：12

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