Fabrication of Cu nano particles by direct electrochemical reduction from CuO nano particles

被引：64

作者：

Han, WK

Choi, JW

Hwang, GH

Hong, SJ

Lee, JS

Kang, SG ^{[1
]}

机构：

[1] Hanyang Univ, Div Mat Sci & Engn, Seoul 133791, South Korea

[2] Hanyang Univ, Dept Met & Mat Sci, Ansan 426791, South Korea

来源：

APPLIED SURFACE SCIENCE | 2006年 / 252卷 / 08期

关键词：

Cu nano particles; direct electrochemical reduction; cyclic voltammetry; XPS;

D O I：

10.1016/j.apsusc.2005.04.049

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

In this report, Cu nano particles have been prepared by direct electrochemical reduction from CuO nano particles and the reduction mechanism was investigated. To investigate the reduction mechanism, CuO has been deposited on the AISI 430 by magnetron sputtering in various Ar/O-2 ratio and the cyclic voltammetry (CV) was performed in 0.5 M NaCl solution at 300 K. This result indicated that the oxygen from the CuO was ionized at -0.874 V (versus SCE) and reduced to Cu. To fabricate Cu nano particles, we employed CuO nano particles, which were prepared by a conventional mechanical milling, with a dc rectifier and the specific electrochemical cell. The structure of the films and nano particles were analyzed by XRD, SEM/EDS and XPS. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：2832 / 2838

页数：7

共 22 条

[1] Nanoparticles with Raman spectroscopic fingerprints for DNA and RNA detection [J].