Magnetic anisotropy of Co on Cu(1 1 17)

被引:38
作者
Wulfhekel, W
Knappmann, S
Oepen, HP
机构
[1] Inst. Grenzfiachenforschung V., Forschungszentrum Jülich
关键词
D O I
10.1063/1.360884
中图分类号
O59 [应用物理学];
学科分类号
摘要
The in-plane magnetic anisotropy of ultra-thin Co films, epitaxially grown on Cu(1 1 17), was determined in situ by means of the magneto-optic Kerr effect down to thicknesses as low as 2 monolayers. Uniaxial and biaxial anisotropy contributions were observed. At room temperature, the uniaxial component is dominant and the easy axis of magnetization is parallel to the step edges. Above 4 monolayers the magnetic anisotropy exhibits a thickness dependence which can be described by volume and interface contributions. For thinner films a pronounced deviation from that behavior is found. The anisotropy drops abruptly by one order of magnitude below 3 monolayers. Thickness dependent relaxations are proposed as driving forces for that behavior. (C) 1996 American Institute of Physics.
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页码:988 / 992
页数:5
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