Free-carrier plasma resonance effects and electron transport in reactively sputtered degenerate ZnO:Al films

被引:87
作者
Brehme, S
Fenske, F
Fuhs, W
Nebauer, E
Poschenrieder, M
Selle, B [1 ]
Sieber, I
机构
[1] Hahn Meitner Inst Kernforsch Berlin GmbH, Abt Photovolta, Berlin, Germany
[2] Ferdinand Braun Inst Hochstfrequenztechn, D-12489 Berlin, Germany
关键词
electrical properties and measurements; infrared spectroscopy; structural properties; zinc oxide;
D O I
10.1016/S0040-6090(98)01490-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The electrical and infrared optical properties of reactively d.c. sputtered polycrystalline ZnO:Al films grown at varying oxygen flow rates were studied on samples prepared in the same deposition run. The carrier concentrations determined by Hall measurements were in the degeneration range. Relating them with the optical free-carrier resonance frequencies the effective electron mass was higher than in non-degenerate ZnO. The values of the optical mobility, calculated from the Drude damping factor, and of the Hall mobility were in the same order of magnitude. This suggests that the low carrier mobility in these films is mainly caused by scattering processes taking place within the film grains and that grain boundary scattering plays a minor role. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:167 / 173
页数:7
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