Preparation of zinc oxide films by oxygen plasma treatment of zinc foils

被引：17

作者：

Draou, K

Bellakhal, N

Cheron, BG

Brisset, JL

机构：

[1] UFR SCI & TECH ROUEN,DEPT CHIM,EQUIPE ELECTROCHIM,F-76821 MONT ST AIGNAN,FRANCE

[2] UFR SCI & TECH ROUEN,URA 230,CORIA,F-76821 MONT ST AIGNAN,FRANCE

来源：

MATERIALS CHEMISTRY AND PHYSICS | 1997年 / 51卷 / 02期

关键词：

ZnO; oxygen plasma; thin oxide films; surface treatment; FTIR; UV-Vis-NIR; cathodic reduction;

D O I：

10.1016/S0254-0584(97)80283-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Exposure of zinc foils to an inductively coupled low pressure r.f. oxygen plasma leads to the formation of ZnO thin films which are spectroscopically and electrochemically characterized. The oxidation kinetics depends on the time exposure to the plasma at axed electric power and gas pressure. (C) 1997 Elsevier Science S.A.

引用

页码：142 / 146

页数：5

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