Dynamic self-organization phenomena in complex ionized gas systems: new paradigms and technological aspects

被引:314
作者
Vladimirov, SV [1 ]
Ostrikov, K
机构
[1] Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
[2] Flinders Univ S Australia, Sch Chem Phys & Earth Sci, Adelaide, SA 5001, Australia
[3] Nanyang Technol Univ, NIE, Plasma Sources & Applicat Ctr NE, Singapore 637616, Singapore
来源
PHYSICS REPORTS-REVIEW SECTION OF PHYSICS LETTERS | 2004年 / 393卷 / 3-6期
基金
澳大利亚研究理事会;
关键词
D O I
10.1016/j.physrep.2003.12.003
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
An overview of dynamic self-organization phenomena in complex ionized gas systems, associated physical phenomena, and industrial applications is presented. The most recent experimental, theoretical, and modeling efforts to understand the growth mechanisms and dynamics of nano- and micron-sized particles, as well as the unique properties of the plasma-particle systems (colloidal, or complex plasmas) and the associated physical phenomena are reviewed and the major technological applications of micro- and nanoparticles are discussed. Until recently, such particles were considered mostly as a potential hazard for the microelectronic manufacturing and significant efforts were applied to remove them from the processing volume or suppress the gas-phase coagulation. Nowadays, fine clusters and particulates find numerous challenging applications in fundamental science as well as in nanotechnology and other leading high-tech industries. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:175 / 380
页数:206
相关论文
共 393 条
[1]   Morphology control of films formed by atmospheric-pressure chemical vapor deposition using tetraethylorthosilicate/ozone system [J].
Adachi, M ;
Okuyama, K ;
Fujimoto, T ;
Sato, J ;
Muroyama, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (08) :4438-4443
[2]   Modeling of dust in a silane/hydrogen plasma [J].
Akdim, MR ;
Goedheer, WJ .
JOURNAL OF APPLIED PHYSICS, 2003, 94 (01) :104-109
[3]   SOME RESEARCHES ON DOUBLE-LAYERS [J].
ALLEN, JE .
PLASMA PHYSICS AND CONTROLLED FUSION, 1985, 27 (12) :1343-1357
[4]   Particulates in C(2)F(6)-CHF(3) and CF(4)-CHF(3) etching plasmas [J].
Anderson, Harold M. ;
Radovanov, Svetlana ;
Mock, Joseph L. ;
Resnick, Paul J. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1994, 3 (03) :302-309
[5]   Complex-plasma boundaries [J].
Annaratone, BM ;
Khrapak, SA ;
Bryant, P ;
Morfill, GE ;
Rothermel, H ;
Thomas, HM ;
Zuzic, M ;
Fortov, VE ;
Molotkov, VI ;
Nefedov, AP ;
Krikalev, S ;
Semenov, YP .
PHYSICAL REVIEW E, 2002, 66 (05) :4-056411
[6]   Levitation of cylindrical particles in the sheath of an rf plasma -: art. no. 036406 [J].
Annaratone, BM ;
Khrapak, AG ;
Ivlev, AV ;
Söllner, G ;
Bryant, P ;
Sütterlin, R ;
Konopka, U ;
Yoshino, K ;
Zuzic, M ;
Thomas, HM ;
Morfill, GE .
PHYSICAL REVIEW E, 2001, 63 (03) :364061-364066
[7]  
[Anonymous], PHOTON CORRELATION L
[8]   Sheath modification in the presence of dust particles [J].
Arnas, C ;
Mikikian, M ;
Bachet, G ;
Doveil, F .
PHYSICS OF PLASMAS, 2000, 7 (11) :4418-4422
[9]   SPATIALLY AVERAGED (GLOBAL) MODEL OF TIME MODULATED HIGH-DENSITY ARGON PLASMAS [J].
ASHIDA, S ;
LEE, C ;
LIEBERMAN, MA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (05) :2498-2507
[10]   Effect of charge reduction on shielding in dusty plasmas [J].
Avinash, K ;
Bhattacharjee, A ;
Merlino, R .
PHYSICS OF PLASMAS, 2003, 10 (07) :2663-2666