Morphology control of films formed by atmospheric-pressure chemical vapor deposition using tetraethylorthosilicate/ozone system

The effects of the reaction time of gas-phase intermediates, t(r), initial concentrations of TEOS (C-TEOSin) and O-3 (C-O3in), and O-3 concentration on a substrate C-O3s, on film formation by atmospheric-pressure chemical vapor deposition using tetraethylorthosilicate (TEOS) and ozone (O-3) were experimentally investigated. These four deposition parameters were altered by varying the merge position of TEOS/He and O-3/O-2 mixtures and the substrate position in the reactor. The structure of the intermediates was estimated from the chemical analysis of nanometer-sized particles generated during the film formation. The flow shape, the substrate dependence, and the chemical structure of films depended mainly on C-TEOSin and C-O3in; but were independent of C-O3s. The parameter t(r) had little effect on the flow shape and substrate dependence. The intermediates that led to the formation of films with excellent flow shape and a small amount of water contained a large amount of carbon.