Interdiffusion and surface segregation in stacked self-assembled InAs/GaAs quantum dots

被引:55
作者
Lita, B [1 ]
Goldman, RS
Phillips, JD
Bhattacharya, PK
机构
[1] Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA
[2] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA
关键词
D O I
10.1063/1.125153
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated interdiffusion and surface segregation in molecular-beam-epitaxially-grown stacked self-assembled InAs/GaAs quantum dots. Using high-resolution cross-sectional scanning tunneling microscopy, we observe lateral variations in the vertical positions of In atoms in both the wetting layers and dot stacks. In some regions, the wetting layer thickness is much less than the dot height, while in other regions, the dot is immersed in the wetting layer. Using In and Ga atom counting, we obtain vertical In-Ga interdiffusion and 1/e segregation lengths of 1.25 and 2.8 nm, respectively. In the dot stacks, significant In-Ga intermixing, primarily due to In surface segregation, is apparent. (C) 1999 American Institute of Physics. [S0003- 6951(99)04244-8].
引用
收藏
页码:2797 / 2799
页数:3
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