Structural changes induced by KrF excimer laser photons in H2-loaded Ge-doped SiO2 glass

被引:62
作者
Fujimaki, M [1 ]
Kasahara, T [1 ]
Shimoto, S [1 ]
Miyazaki, N [1 ]
Tokuhiro, S [1 ]
Seol, KS [1 ]
Ohki, Y [1 ]
机构
[1] Waseda Univ, Dept Elect Electr & Comp Engn, Shinjuku Ku, Tokyo 1698555, Japan
来源
PHYSICAL REVIEW B | 1999年 / 60卷 / 07期
关键词
D O I
10.1103/PhysRevB.60.4682
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Photochemical reactions related to the Ge lone-pair center (GLPC) that an induced by KrF excimer laser photons in H-2-loaded Ge-doped SiO2 glass have been investigated. Without the H-2 loading, the Ge electron center (GEC) and the positively charged GLPC were induced by the laser irradiation. In the H-2-loaded sample, the GEC, the Ge E' center, and the germyl radical (GR) were induced by the irradiation, while the positively charged GLPC was not observed after the irradiation. If the H-2-loaded sample was thermally annealed after the photon irradiation, the concentration of the photo-induced GEC decreased monotonically with an increase in the annealing temperature. On the other hand, the concentration of the GR increased up to the annealing temperature of 160 degrees C, and it decreased at higher temperatures. Without the pre-irradiation, the induction of the GR was not observed even in the H-2-loaded sample. From these results, it is concluded that the positively charged GLPC is terminated with a hydrogen atom in the H-2-loaded sample and then becomes the GR by trapping an electron thermally released from the GEC. [S0163-1829(99)05631-3].
引用
收藏
页码:4682 / 4687
页数:6
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