Atomic-scale models of interactions between inversion domain boundaries and intrinsic basal stacking faults in GaN

被引:8
作者
Kioseoglou, J
Dimitrakopulos, GP
Polatoglou, HM
Lymperakis, L
Nouet, G
Komninou, P [1 ]
机构
[1] Aristotle Univ Thessaloniki, Dept Phys, Solid State Sect, GR-54006 Thessaloniki, Greece
[2] Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
[3] Inst Sci Mat & Rayonnement, UMR 6508 CNRS, CRISMAT, ESCTM, F-14050 Caen, France
关键词
gallium nitride (GaN); planar defects; characterization; modeling;
D O I
10.1016/S0925-9635(02)00017-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Interactions between inversion domain boundaries (IDBs) and intrinsic basal stacking faults (SFs) in wurtzite-structured GaN grown on (0001) sapphire were studied using high-resolution electron microscopy (HREM) observations and empirical potential calculations. In one type of interaction, an SF terminates on an IDB, thereby inducing a transformation from a low-energy and electrically non-active IDB structure to a high-energy, electrically active one. In a second interaction, the SF crosses the IDB without changing its structure. These configurations were topologically established a priori, and were confirmed by experimental observations. It was found that the first junction line exhibits partial dislocation character, while the second is defect-free. Atomic-scale periodic supercells of the interactions have been produced and the relative energy values are discussed. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:905 / 909
页数:5
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