Inversion domain and stacking mismatch boundaries in GaN

被引:240
作者
Northrup, JE
Neugebauer, J
Romano, LT
机构
[1] Xerox Palo Alto Research Center, Palo Alto, CA, 94304
关键词
D O I
10.1103/PhysRevLett.77.103
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We present first-principles calculations of domain wall energies for inversion domain boundaries and stacking mismatch boundaries in GaN. We find a low-energy inversion domain boundary in which each atom remains fourfold coordinated without the formation of Ga-Ga or N-N bonds. This boundary, denoted IDB*, does not induce electronic states in the band gap and would therefore not adversely impact photoluminescence efficiency. The stacking mismatch boundary has a higher formation energy than IDB*, and gives rise to occupied N-derived interface states in the band gap.
引用
收藏
页码:103 / 106
页数:4
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