Electrostatic Force Assisted Exfoliation of Prepatterned Few-Layer Graphenes into Device Sites

被引：97

作者：

Liang, Xiaogan ^{[1
]}

Chang, Allan S. P. ^{[1
]}

Zhang, Yuegang ^{[1
]}

Harteneck, Bruce D. ^{[1
]}

Choo, Hyuck ^{[1
]}

Olynick, Deirdre L. ^{[1
]}

Cabrini, Stefano ^{[1
]}

机构：

[1] Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA

来源：

NANO LETTERS | 2009年 / 9卷 / 01期

基金：

美国国家科学基金会;

关键词：

PYROLYTIC-GRAPHITE; CARBON; BANDGAP;

D O I：

10.1021/nl803512z

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We present a novel fabrication method for incorporating nanometer to micrometer scale few-layer graphene (FLG) features onto substrates with electrostatic exfoliation. We pattern highly oriented pyrolytic graphite using standard lithographic techniques and subsequently, in a single step, exfoliate and transfer-print the prepatterned FLG features onto a silicon wafer using electrostatic force. We have successfully demonstrated the exfoliation/printing of 18 nm wide FLG nanolines and periodic arrays of 1.4 mu m diameter pillars. Furthermore, we have fabricated graphene nanoribbon transistors using the patterned graphene nanoline. Our electrostatic force assisted exfoliation/print process does not need additional adhesion layers and could be stepped and repeated to deliver the prepatterned graphitic material over wafer-sized areas and allows the construction of graphene-based integrated circuits.

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收藏

页码：467 / 472

页数：6

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