Molecular beam epitaxial growth and properties of short-wave infrared Hg0.3Cd0.7Te films

被引:5
作者
Rajavel, RD
Wu, OK
Jamba, DM
deLyon, TJ
机构
[1] Hughes Research Laboratories, Malibu
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 03期
关键词
D O I
10.1116/1.588861
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Hg1-xCdxTe films with cut-off wavelengths ranging from 1.25 to 1.65 mu m (at 300 K) in the short wave infrared band were prepared by molecular beam epitaxy. The structural perfection of the Hg1-xCdxTe films was strongly dependent on the degree of lattice matching provided by the substrate. First reports of in situ p-type doping of Hg1-xCdxTe (x approximate to 0.7) alloys by molecular beam epitaxy is presented here. Electron and hole concentration in excess of 1 x 10(17) cm(-3) were measured in In and As doped films, respectively. Analysis of variable temperature Hall effect data assuming singly ionized impurities provided activation energies of 28.5 meV for As accepters, and 2.95 meV for In donors. (C) 1996 American Vacuum Society.
引用
收藏
页码:2362 / 2365
页数:4
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