Factors affecting extended hydration depths in ion-implanted fused silica

被引：11

作者：

Arnold, GW ^{[1
]}

DeMarchi, G ^{[1
]}

Mazzoldi, P ^{[1
]}

Battaglin, G ^{[1
]}

机构：

[1] UNIV VENICE,DIPARTIMENTO CHIM FIS,I-30123 VENICE,ITALY

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1996年 / 116卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(96)00071-7

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 [仪器科学与技术]; 080401 [精密仪器及机械]; 081102 [检测技术与自动化装置];

摘要：

The implantation of fused silica to high collisional energy deposition levels allows penetration of hydrogenic species, either from aqueous solutions or atmospheric ambients, to depths exceeding the theoretical ranges by a factor of 2-3. In the case of ambient exposure, hydration is known to persist over periods of years after implantation, Extended depths are also seen for etching, gaseous implant distribution, and alkali depletion. The phenomena are examined using the modeling of strained silica structures as the driving force for slow fracture and the extensive structural understanding provided by sol-gel investigations.

引用

页码：364 / 368

页数：5

共 31 条

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[2]

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