Plasma nitriding of Ti6Al4V alloy and AISI M2 steel substrates using DC glow discharges under a triode configuration

被引:34
作者
Avelar-Batista, JC
Spain, E
Housden, J
Matthews, A
Fuentes, GG
机构
[1] Tecvac Ltd, Cambridge CB4 5UG, England
[2] Univ Sheffield, Dept Mat Engn, Sheffield S1 3JD, S Yorkshire, England
[3] Ctr Adv Surface Engn AIN, E-31191 Pamplona, Spain
关键词
plasma nitriding; PAPVD; DC triode glow discharges;
D O I
10.1016/j.surfcoat.2005.08.037
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Plasma nitriding of different substrates such as Ti6A14V and AlSl M2 steel was achieved by means of D.C. glow discharges assisted by thermionic emission (triode configuration). The higher ionisation levels achieved using a D.C. triode configuration reduced the treatment time and nitriding temperature required to obtain hard and reasonably deep nitrided cases in the Ti6A14V alloy. For this alloy, surface hardness values of 560-600 HV0.05 and nitrided layer depths of 30-40 mu m were achieved at 700 degrees C. Up to this nitriding temperature, hardening seemed to be mainly accomplished by incorporation of nitrogen in the alpha-Ti phase, as the formation of a titanium nitride layer on the surface could not be detected by SEM. For the AIR M2 steel, hard (1379-1524 HV0.05) nitrided layers of 100- 150 mu m were obtained at 480-500 degrees C for 240 min, depending on total pressure, gas composition and substrate bias. For the highest nitrogen concentration and lowest bias voltage, no compound layer was formed. The triode plasma nitriding process allowed a significant reduction in processing time for both M2 steel and Ti6Al4V alloy in comparison to conventional D.C. diode plasma nitriding. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:1954 / 1961
页数:8
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