Electron induced chemical nanolithography with self-assembled monolayers

We demonstrate a simple scheme to generate chemical surface nanostructures. Electron-beam writing is used to locally modify the terminal nitro functionality in self-assembled monolayers of 4'-nitro-1,1'-biphenyl-4-thiol to amino groups, while the underlying aromatic layer is dehydrogenated and cross linked. Using low energy electron proximity printing and conventional electron-beam lithography with a beam energy of 2.5 keV and doses from 2500 to 50 000 muC/cm(2) templates of reactive amino sites with lateral dimensions down to similar to20 nm could be fabricated. The templates were used for the surface immobilization of fluorinated carboxylic acid anhydrides and rhodamine dyes. The molecular structures were then imaged and analyzed by atomic force and scanning confocal fluorescence microscopy. (C) 2001 American Vacuum Society.