Chemical kinetics and energy transfer in moderate pressure H2 plasmas used in diamond MPACVD processes

被引:120
作者
Hassouni, K
Gicquel, A
Capitelli, M
Loureiro, J
机构
[1] Univ Paris 13, Villetaneuse, France
[2] Univ Paris 13, LIMHP, CNRS, F-93430 Villetaneuse, France
[3] Univ Bari, Ctr Studi Chim Plasmi, CNR, Bari, Italy
[4] Univ Tecn Lisboa, Inst Super Tecn, Ctr Fis Plasma, P-1096 Lisbon, Portugal
关键词
D O I
10.1088/0963-0252/8/3/320
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A kinetic model for moderate-pressure microwave H-2 plasmas obtained in diamond deposition reactors is presented. This model involves three groups of reactions which describe the vibrational kinetics of H-2, the chemistry of H-2 and H electronically excited states and the groundstate species kinetics, respectively. The set of species kinetic equations resulting from this model, coupled to the electron Boltzmann equation and the total energy equation were solved under a quasi-homogenous plasma assumption. This enables the estimation of the species densities, the electron distribution function and related electron properties, as well as the gas temperature. The results show that the most important ionization channel is that due to the quenching of H (n = 2) excited states by H-2. The production of the H-atom is mainly due to electron impact dissociation at low microwave power density and to thermal dissociation at high power density. A simplified physical model which may be used for describing the non-equilibrium H-2 plasma flow in diamond deposition microwave plasmas reactors is also proposed.
引用
收藏
页码:494 / 512
页数:19
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