Plasma polymerization of thin films: Correlations between plasma chemistry and thin film character

被引：22

作者：

Guerin, DC ^{[1
]}

Hinshelwood, DD ^{[1
]}

Monolache, S ^{[1
]}

Denes, FS ^{[1
]}

Shamamian, VA ^{[1
]}

机构：

[1] USN, Res Lab, Washington, DC 20375 USA

来源：

LANGMUIR | 2002年 / 18卷 / 10期

关键词：

D O I：

10.1021/la011566j

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Organic thin films were deposited by plasma-enhanced chemical vapor deposition, using isopropyl alcohol as a precursor. The pulsed, inductively coupled plasma was characterized with in situ Langmuir probe measurements and mass spectrometry. We identify the key ionized species diffusing to the substrate and offer explanations as to how they are generated. The films were analyzed with X-ray photoelectron spectroscopy. Correlations were observed between the plasma ion mass distributions and the oxidation state of the deposited carbon.

引用

页码：4118 / 4123

页数：6

共 33 条

[1] SPATIALLY AVERAGED (GLOBAL) MODEL OF TIME MODULATED HIGH-DENSITY ARGON PLASMAS [J].