Short-pulse laser damage in transparent materials as a function of pulse duration

被引：534

作者：

Tien, AC ^{[1
]}

Backus, S ^{[1
]}

Kapteyn, H ^{[1
]}

Murnane, M ^{[1
]}

Mourou, G ^{[1
]}

机构：

[1] Univ Michigan, Ctr Ultrafast Opt Sci, Ann Arbor, MI 48109 USA

来源：

PHYSICAL REVIEW LETTERS | 1999年 / 82卷 / 19期

关键词：

D O I：

10.1103/PhysRevLett.82.3883

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We present a single-shot damage threshold measurement and modeling for fused silica at 800 nm as a function of pulse duration down to 20 fs. We examine the respective roles of multiphoton ionization, tunnel ionization, and impact ionization in laser damage. We find that avalanche predominates even in the case of sub-100-fs pulses.

引用

页码：3883 / 3886

页数：4

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