The effect of NH3 plasma pre-treatment on the adhesion property of(Ti1-xAlx)N coatings deposited by plasma-enhanced chemical vapor deposition

被引:9
作者
Kim, BJ
Kim, YC
Lee, JJ [1 ]
机构
[1] Seoul Natl Univ, Sch Mat Sci & Engn, Seoul 151742, South Korea
[2] LG Semicon Co Ltd, Hungduk Gu, Cheongju Si 361480, South Korea
关键词
adhesion property; NH3; pre-treatment; PECVD; (Ti; Al)N;
D O I
10.1016/S0257-8972(99)00026-2
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
(Ti1-XAlX)N has been coated on high speed steel (HSS) substrate by a plasma-enhanced chemical vapor deposition (PECVD) process from a gas mixture of TiCl4, AlCl3, NH3, H-2, and Ar. Prior to deposition, the substrate was treated by NH3 plasma in the same deposition chamber. It has been found that CrN was formed on the substrate surface after the NH3 treatment. Iron compounds which are known to degrade the adhesion property of the coating, however, were not observed. The lattice parameters of the HSS and the coatings increased after the NH3 treatment by the incorporation of nitrogen atoms. The microhardness of (Ti1-XAlX)N however, was not changed by the pre-treatment. The adhesion strength of the coatings without the NH, treatment decreased considerably when X-Al in (Ti1-XAlX)N was greater than 0.15, which could be increased markedly by the substrate treatment with NH3 plasma. The improvement of the adhesion was achieved by the decrease of the stress gradient at the interface of the substrate and the coating resulted from the formation of TiN prior to (Ti1-XAlX)N as well as by the different lattice parameter change between the substrate and the coating after the plasma treatment. Oxide removal on the substrate surface also contributed to the adhesion improvement. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:85 / 89
页数:5
相关论文
共 16 条
[1]   DESIGN AND CHARACTERIZATION OF A COMPACT 2-TARGET ULTRAHIGH-VACUUM MAGNETRON SPUTTER DEPOSITION SYSTEM - APPLICATION TO THE GROWTH OF EPITAXIAL TI1-XALXN ALLOYS AND TIN/TI1-XALXN SUPERLATTICES [J].
ADIBI, F ;
PETROV, I ;
GREENE, JE ;
WAHLSTROM, U ;
SUNDGREN, JE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (01) :136-142
[2]   INTERFACE STUDY OF PHYSICAL VAPOR-DEPOSITION TIN COATINGS ON PLASMA-NITRIDED STEELS [J].
DHAEN, J ;
QUAEYHAEGENS, C ;
STALS, LM ;
VANSTAPPEN, M .
SURFACE & COATINGS TECHNOLOGY, 1993, 61 (1-3) :194-200
[3]   EFFECT OF PLASMA NITRIDING ON THE PROPERTIES OF (TI, AL)N COATINGS DEPOSITED ONTO HOT WORK STEEL SUBSTRATES [J].
GREDIC, T ;
ZLATANOVIC, M ;
POPOVIC, N ;
BOGDANOV, Z .
THIN SOLID FILMS, 1993, 228 (1-2) :261-266
[4]   COMPOSITIONALLY GRADIENT (TI1-XALX)N COATINGS MADE BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION [J].
LEE, SH ;
LEE, JJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (04) :2030-2034
[5]   (TI1-XALX)N COATINGS BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION [J].
LEE, SH ;
RYOO, HJ ;
LEE, JJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1994, 12 (04) :1602-1607
[6]   Structural analysis of AlN and (Ti1-xAlx)N coatings made by plasma enhanced chemical vapor deposition [J].
Lee, SH ;
Kim, BJ ;
Kim, HH ;
Lee, JJ .
JOURNAL OF APPLIED PHYSICS, 1996, 80 (03) :1469-1473
[7]  
LEE SH, 1997, J KOREAN I MET MAT, V35, P15
[8]   THE DEVELOPMENT OF THE PVD COATING TIALN AS A COMMERCIAL COATING FOR CUTTING TOOLS [J].
LEYENDECKER, T ;
LEMMER, O ;
ESSER, S ;
EBBERINK, J .
SURFACE & COATINGS TECHNOLOGY, 1991, 48 (02) :175-178
[9]   THE INFLUENCE OF THE PHYSICOCHEMICAL CHARACTERISTICS OF THE SUBSTRATE SURFACE ON THE DEPOSITED TIN FILM PROPERTIES [J].
MILIC, M ;
MILOSAVLJEVIC, M ;
BIBIC, N ;
POPOVIC, N ;
BOGDANOV, Z .
THIN SOLID FILMS, 1988, 163 :309-316
[10]  
MIN WS, 1995, J KOREAN I MET MAT, V33, P1083