Plasmon waveguide for optical far/near-field conversion

被引：100

作者：

Yatsui, T

Kourogi, M

Ohtsu, M

机构：

[1] Japan Sci & Technol Corp, Tokyo 1940004, Japan

[2] Tokyo Inst Technol, Interdisciplinary Grad Sch Sci & Engn, Midori Ku, Kanagawa 2268502, Japan

来源：

APPLIED PHYSICS LETTERS | 2001年 / 79卷 / 27期

关键词：

D O I：

10.1063/1.1428405

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A plasmon waveguide was designed and fabricated using a metal-coated silicon wedge structure that converts propagating far-field light to the near field. Illumination (lambda =830 nm) of the waveguide (plateau width 150 nm) caused transverse magnetic plasmon-mode excitation. Use of a near-field microscope allowed us to determine its beam width and propagation length as 150 nm and 2.5 mum, respectively. (C) 2001 American Institute of Physics.

引用

页码：4583 / 4585

页数：3

共 22 条

[1] DIELECTRIC ISOLATION OF SILICON BY ANODIC BONDING [J].