DIELECTRIC ISOLATION OF SILICON BY ANODIC BONDING

被引:62
作者
ANTHONY, TR
机构
关键词
D O I
10.1063/1.336143
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1240 / 1247
页数:8
相关论文
共 20 条
[1]   ANODIC BONDING OF IMPERFECT SURFACES [J].
ANTHONY, TR .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) :2419-2428
[2]   GRAIN-DRIVEN ZONE-MELTING [J].
ANTHONY, TR .
JOURNAL OF APPLIED PHYSICS, 1984, 56 (02) :477-485
[3]   LOW-TEMPERATURE ELECTROSTATIC SILICON-TO-SILICON SEALS USING SPUTTERED BOROSILICATE GLASS [J].
BROOKS, AD ;
HARDESTY, CA ;
DONOVAN, RP .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (04) :545-&
[4]  
BROWNLOW JM, 1978, IBM RC7101 REP
[5]   ZONE-MELTING RECRYSTALLIZATION OF SI FILMS WITH A MOVEABLE-STRIP-HEATER OVEN [J].
GEIS, MW ;
SMITH, HI ;
TSAUR, BY ;
FAN, JCC ;
SILVERSMITH, DJ ;
MOUNTAIN, RW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (12) :2812-2818
[6]  
GIBBONS JF, 1981, LASER ELECTRON BEAM, P449
[7]  
JASTRZEBSKI L, 1983, RCA REV, V44, P250
[8]  
KAMMIS TI, 1979, APPL PHYS LETT, V35, P282
[9]  
Kennedy J. C., 1964, PHYS CHEM GLASSES-B, V5, P130