Dynamic variation of the sticking coefficient of oxygen atoms helicon-wave excited high-density oxygen plasmas

被引:24
作者
Matsushita, J [1 ]
Sasaki, K [1 ]
Kadota, K [1 ]
机构
[1] NAGOYA UNIV,DEPT ELECT,NAGOYA,AICHI 46401,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1997年 / 36卷 / 7B期
关键词
sticking coefficient; surface coverage; particle flux; lifetime; oxygen atoms; two-photon laser-induced fluorescence; helicon-wave plasma source;
D O I
10.1143/JJAP.36.4747
中图分类号
O59 [应用物理学];
学科分类号
摘要
The sticking coefficient of O atoms on a chamber wall was determined by lifetime measurements in afterglow oxygen plasmas using two-photon laser-induced fluorescence spectroscopy. The sticking coefficient was strongly dependent on the discharge conditions. When the discharge duration was short or the oxygen gas pressure was low, the sticking coefficient was close to unity and the lifetime of O atoms was equal to the diffusion time determined by the chamber geometry. However, for a long discharge duration and a high oxygen pressure, the sticking coefficient was considerably lower and saturated at similar to 0.1. The decrease in the sticking coefficient can be explained by the increase in the surface coverage due to adsorption of O atoms during the discharge. The number of O atoms which was sufficient to decrease the sticking coefficient to similar to 0.1 was determined experimentally to be on the order of 10(15) cm(-2).
引用
收藏
页码:4747 / 4751
页数:5
相关论文
共 10 条
[1]   OXYGEN AND FLUORINE ATOM KINETICS IN ELECTRON-CYCLOTRON RESONANCE PLASMAS BY TIME-RESOLVED ACTINOMETRY [J].
BOOTH, JP ;
SADEGHI, N .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (02) :611-620
[2]  
BOOTH JP, 1991, J APPL PHYS, V69, P15
[3]  
Brake M., 1983, Plasma Chemistry and Plasma Processing, V3, P63, DOI 10.1007/BF00566028
[4]  
KADOTA K, 1994, JPN J APPL PHYS, V33, P4038
[5]  
LIEBERMAN MA, 1994, PRINCIPLES PLASMA DI, P286
[6]   OXIDATION OF GAAS SURFACE BY OXYGEN PLASMA AND ITS APPLICATION AS AN ANTIREFLECTION LAYER [J].
LOONG, WA ;
CHANG, HL .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1991, 30 (7B) :L1319-L1320
[7]  
Reid R. C., 1977, The Properties of Gases and Liquids
[8]   DAMAGE CAUSED BY RF OXYGEN PLASMA ASHER [J].
SAMUKAWA, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1989, 28 (08) :L1467-L1469
[9]   Plasma production by helicon waves [J].
Shoji, T. ;
Sakawa, Y. ;
Nakazawa, S. ;
Kadota, K. ;
Sato, T. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1993, 2 (01) :5-10
[10]  
WALKUP RE, 1986, J CHEM PHYS, V84, P2688