Study of the growth mechanisms of chromium nitride films deposited by vacuum ARC evaporation

Chromium nitride films have been deposited using the vacuum are evaporation technique. The influence of the main deposition parameters (nitrogen pressure p(N2), substrate temperature T-s, substrate bias voltage V-s and argon partial pressure p(Ar)) on the structural and mechanical properties of the coatings has been investigated. It has been found that the nitrogen pressure determines the phase composition in the layers, while T-s, V-s and p(Ar) have more direct effects on the texture of the films. The mechanical properties which depend on the composition but also on the structure and the morphology of the coatings, exhibit a strong dependence on all the deposition parameters. (C) 1997 Elsevier Science S.A.