Invited paper: Technological challenges for large-size AMOLED display

被引:27
作者
Kim, Hye Dong [1 ]
Jeong, Jae Kyeong [1 ]
Chung, Hyun-Joong [1 ]
Mo, Yeon-Gon [1 ]
机构
[1] Samsung SDI Co Ltd, Corp R&D Ctr, Yongin 449577, Kyungki Do, South Korea
来源
2008 SID INTERNATIONAL SYMPOSIUM, DIGEST OF TECHNICAL PAPERS, VOL XXXIX, BOOKS I-III | 2008年 / 39卷
关键词
D O I
10.1889/1.3069649
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In this work, we review the current technological challenges for large-size AMOLED displays with an emphasis on the backplane technology. Then, it will be discussed how the new technology of oxide TFTs combines the advantages of LTPS and a-Si TFTs to make an optimal solution for large-size backplanes. In particular, we reveal the technolgical challenges in oxide TFTs by comparing the device characteristics of conventional excimer laser annealing (ELA) LTPS and amorphous indium-gallium-zinc-oxide (a-IGZO) TFTs. Finally, we demonstrate a 12.1" WXGA AMOLED prototype display fabricated by an a-IGZO TFT backplane.
引用
收藏
页码:291 / 294
页数:4
相关论文
共 10 条
[1]  
ARAI T, 2007, SID 07, P1370
[2]  
BOROSON M, 2005, SID 05, P972
[3]  
Chung H.K., 2005, SID 05, P956
[4]  
CHUNG K, 2006, SID 06, P1958
[5]  
GOHDA T, 2006, SID 06, P1767
[6]  
HIRANO T, 2007, SID 07, P1592
[7]  
JEONG JK, 2007, P IMID DAEG KOR, P145
[8]   Amorphous gallium indium zinc oxide thin film transistors: Sensitive to oxygen molecules [J].
Kang, Donghun ;
Lim, Hyuck ;
Kim, Changjung ;
Song, Ihun ;
Park, Jaechoel ;
Park, Youngsoo ;
Chung, JaeGwan .
APPLIED PHYSICS LETTERS, 2007, 90 (19)
[9]  
LEE HN, 2007, P IDW, P663
[10]  
LEE ST, 2007, SID 07, P1588