Amorphous gallium indium zinc oxide thin film transistors: Sensitive to oxygen molecules

被引:593
作者
Kang, Donghun
Lim, Hyuck
Kim, Changjung
Song, Ihun
Park, Jaechoel
Park, Youngsoo
Chung, JaeGwan
机构
[1] Samsung Adv Inst Technol, Semicond Device Lab, Yongin 449712, Gyeonggi Do, South Korea
[2] Samsung Adv Inst Technol, Analyt Engn Ctr, Yongin 449712, Gyeonggi Do, South Korea
关键词
D O I
10.1063/1.2723543
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this study, the authors report characteristic of indium gallium zinc oxides (GIZOs) which is strongly associated with the film surface. In ambient air, turn-on voltage of GIZO thin film transistors is approximately -7 V. However, at the pressure of 8x10(-6) Torr, the turn-on voltage dramatically shifts to nearly -47 V of the negative gate bias direction. When the oxygen is introduced in the chamber, the turn-on voltage returns to the normal value, that of air. It is believed that the adsorbed oxygen forms depletion layer below the surface, resulting in V-on shifts. The carrier concentration of the channel varies from 1x10(19) to 1x10(20) cm(-3) due to oxygen adsorption. (C) 2007 American Institute of Physics.
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页数:3
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