ZnO-based transparent thin-film transistors

被引:1310
作者
Hoffman, RL
Norris, BJ
Wager, JF
机构
[1] Hewlett Packard Corp, Corvallis, OR 97330 USA
[2] Oregon State Univ, Dept Elect & Comp Engn, Corvallis, OR 97331 USA
关键词
D O I
10.1063/1.1542677
中图分类号
O59 [应用物理学];
学科分类号
摘要
Highly transparent ZnO-based thin-film transistors (TFTs) are fabricated with optical transmission (including substrate) of similar to75% in the visible portion of the electromagnetic spectrum. Current-voltage measurements indicate n-channel, enhancement-mode TFT operation with excellent drain current saturation and a drain current on-to-off ratio of similar to10(7). Threshold voltages and channel mobilities of devices fabricated to date range from similar to10 to 20 V and similar to0.3 to 2.5 cm2/V s, respectively. Exposure to ambient light has little to no observable effect on the drain current. In contrast, exposure to intense ultraviolet radiation results in persistent photoconductivity, associated with the creation of electron-hole pairs by ultraviolet photons with energies greater than the ZnO band gap. Light sensitivity is reduced by decreasing the ZnO channel layer thickness. One attractive application for transparent TFTs involves their use as select-transistors in each pixel of an active-matrix liquid-crystal display. (C) 2003 American Institute of Physics.
引用
收藏
页码:733 / 735
页数:3
相关论文
共 14 条
  • [1] P-type electrical conduction in transparent thin films of CuAlO2
    Kawazoe, H
    Yasukawa, M
    Hyodo, H
    Kurita, M
    Yanagi, H
    Hosono, H
    [J]. NATURE, 1997, 389 (6654) : 939 - 942
  • [2] Preparation of field effect transistor using nano-crystalline GaN
    Kobayashi, S
    Nonomura, S
    Abe, K
    Ushikoshi, K
    Nitta, S
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1998, 227 : 1245 - 1249
  • [3] Fabrication of transparent p-n heterojunction thin film diodes based entirely on oxide semiconductors
    Kudo, A
    Yanagi, H
    Ueda, K
    Hosono, H
    Kawazoe, H
    Yano, Y
    [J]. APPLIED PHYSICS LETTERS, 1999, 75 (18) : 2851 - 2853
  • [4] Room-temperature ferromagnetism in transparent transition metal-doped titanium dioxide
    Matsumoto, Y
    Murakami, M
    Shono, T
    Hasegawa, T
    Fukumura, T
    Kawasaki, M
    Ahmet, P
    Chikyow, T
    Koshihara, S
    Koinuma, H
    [J]. SCIENCE, 2001, 291 (5505) : 854 - 856
  • [5] Current injection emission from a transparent p-n junction composed of p-SrCu2O2/n-ZnO
    Ohta, H
    Kawamura, K
    Orita, M
    Hirano, M
    Sarukura, N
    Hosono, H
    [J]. APPLIED PHYSICS LETTERS, 2000, 77 (04) : 475 - 477
  • [6] Thin film transistor of ZnO fabricated by chemical solution deposition
    Ohya, Y
    Niwa, T
    Ban, T
    Takahashi, Y
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (01): : 297 - 298
  • [7] *PLAN SYST INC, ITO ATO COAT GLASS S
  • [8] A ferroelectric transparent thin-film transistor
    Prins, MWJ
    GrosseHolz, KO
    Muller, G
    Cillessen, JFM
    Giesbers, JB
    Weening, RP
    Wolf, RM
    [J]. APPLIED PHYSICS LETTERS, 1996, 68 (25) : 3650 - 3652
  • [9] Room temperature magnetic (Ga,Mn)N: a new material for spin electronic devices
    Reed, ML
    Ritums, MK
    Stadelmaier, HH
    Reed, MJ
    Parker, CA
    Bedair, SM
    El-Masry, NA
    [J]. MATERIALS LETTERS, 2001, 51 (06) : 500 - 503
  • [10] Carrier mobility and density contributions to photoconductivity transients in polycrystalline ZnO films
    Studenikin, SA
    Golego, N
    Cocivera, M
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 87 (05) : 2413 - 2421