Preparation and characterization of well-ordered, thin niobia films on a metal substrate

被引:25
作者
Starr, DE
Mendes, FMT
Middeke, J
Blum, RP
Niehus, H
Lahav, D
Guimond, S
Uhl, A
Kluener, T
Schmal, M
Kuhlenbeck, H
Shaikhutdinov, S
Freund, JH
机构
[1] Max Planck Gesell, Fritz Haber Inst, Dept Phys Chem, D-14195 Berlin, Germany
[2] Univ Fed Rio de Janeiro, NUCAT, PEQ, COPPE, Rio De Janeiro, Brazil
[3] Humboldt Univ, Inst Phys Oberflachenphys & Atomstossprozesse, D-12489 Berlin, Germany
关键词
thin oxide films; epitaxy; niobia; scanning tunneling microscopy; photoelectron spectroscopy; density functional theory;
D O I
10.1016/j.susc.2005.09.033
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Combining low energy electron diffraction, scanning tunneling microscopy, angular resolved photoelectron spectroscopy using synchrotron radiation and density functional theory calculations, we have studied the structure of thin niobia films grown on a Cu3Au(100) substrate. Nb deposition onto oxygen implanted Cu3Au(100) and subsequent oxidation results in a flat, well-ordered thin niobia film of hexagonal symmetry. The results suggest that the film consists of 2/3 ML of Nb between two hexagonal O-layers, where Nb5+ cations occupy the threefold hollow sites. This leads to a (root 3 x root 3)R30 degrees structure with respect to the underlying close packed 0 layer, which in turn forms a (2 x 7) coincidence structure with the metal substrate. The defect structure includes reflection domain boundaries and vacancies. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:14 / 26
页数:13
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