Modeling scatter from silicon wafer features based on discrete sources method

被引：25

作者：

Eremin, YA

Stover, JC

Orlov, NV

机构：

[1] Moscow MV Lomonosov State Univ, Appl Math & Comp Sci Fac, Moscow 117899, Russia

[2] ADE Opt Syst Corp, Charlotte, NC 28273 USA

来源：

OPTICAL ENGINEERING | 1999年 / 38卷 / 08期

关键词：

light scattering; silicon wafer defects; particle scattering; discrete sources method;

D O I：

10.1117/1.602187

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The discrete sources method (DSM) is extended to investigate complete mathematical models for light scattering from various kinds of silicon wafers features. Computer simulations demonstrate the usefulness of the DSM for comparing scatter signals associated with different surface features. Wafer features such as contaminating particles, subsurface defects and pits are investigated. (C) 1999 Society of Photo-Optical Instrumentation Engineers.

引用

页码：1296 / 1304

页数：9

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