Deposition of CVD diamond onto boron carbide substrates

被引:8
作者
May, PW
Rosser, KN
Fox, NA
Younes, CM
Beardmore, G
机构
[1] UNIV BRISTOL,DEPT PHYS,BRISTOL BS8 1TS,AVON,ENGLAND
[2] UNIV BRISTOL,INTERFACE ANAL CTR,BRISTOL BS2 8BS,AVON,ENGLAND
[3] SMITHS IND DEF SYST,CHELTENHAM GL52 4ZA,GLOS,ENGLAND
关键词
CVD diamond; boron carbide substrates; delamination;
D O I
10.1016/S0925-9635(96)00635-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Boron carbide (B4C) is a hard, lightweight ceramic used in the nuclear and aerospace industries. Depositing a CVD diamond coating onto its surface may increase its wear resistance and hence its value as a structural material in advanced applications, such as gyroscope rotors. Hot filament CVD has been used to deposit 2-4-mu m layers of polycrystalline diamond onto polished B4C blocks. Wie found that adhesion of the diamond coating was poor, with spontaneous delamination occurring. SEM and scanning Auger microscopy determined that boron from the surface of the B4C was diffusing into the CVD diamond to a depth of about 0.1 mu m. This left a B-depleted, C-rich layer al the diamond/B4C interface which caused the delamination of the doped diamond film. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:450 / 455
页数:6
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