THIN-FILM DIAMOND BY CHEMICAL-VAPOR-DEPOSITION METHODS

被引：185

作者：

ASHFOLD, MNR ^{[1
]}

MAY, PW ^{[1
]}

REGO, CA ^{[1
]}

EVERITT, NM ^{[1
]}

机构：

[1] UNIV BRISTOL,DEPT AEROSP ENGN,BRISTOL BS8 1TR,ENGLAND

来源：

CHEMICAL SOCIETY REVIEWS | 1994年 / 23卷 / 01期

关键词：

D O I：

10.1039/cs9942300021

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Diamond is frequently advanced as the 'ultimate' engineering material. This review describes, some of the recent advances in the growth of polycrystalline diamond films by chemical vapour deposition (CVD) methods, various of the more commonly employed surface analysis techniques by which such films are characterized, and the properties required of a substrate if it is to support an adherent diamond film. The article concludes with discussion of already realized, and some potential. applications of CVD diamond films.

引用

页码：21 / 30

页数：10

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