Nonlinear mechanisms of filamentation in broad-area semiconductor lasers

被引:170
作者
Marciante, JR [1 ]
Agrawal, GP [1 ]
机构
[1] USAF,PHILLIPS LAB,SEMICOND LASER BRANCH,KIRTLAND AFB,NM 87117
关键词
OPTICAL AMPLIFIERS; INDEX; GEOMETRY;
D O I
10.1109/3.488831
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
There are three nonlinear mechanisms that can lead to filamentation in broad-area semiconductor lasers: gain-saturation-induced changes in the refractive index through the linewidth-enhancement factor, self-focusing due to heat-induced index changes, and self-defocusing through intensity-dependent index changes in the cladding layer, We present a theoretical model to analyze these mechanisms and their relative roles in destabilizing the laser output, We find that there exists a critical value for the linewidth-enhancement factor below which broad-area lasers are stable for wide stripe widths (as wide as 250 mu m) and high pumping levels (as high as 20 times threshold), We also find that broad-area lasers are less susceptible to filamentation through self-defocusing and show how an intensity-dependent index in the cladding layer may be used to suppress filamentation caused by the linewidth-enhancement factor.
引用
收藏
页码:590 / 596
页数:7
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