Charge storage in CeO2/Si/CeO2/Si(111) structures by electrostatic force microscopy

被引:56
作者
Jones, JT [1 ]
Bridger, PM [1 ]
Marsh, OJ [1 ]
McGill, TC [1 ]
机构
[1] CALTECH, Thomas J Watson Lab Appl Phys, Pasadena, CA 91125 USA
关键词
D O I
10.1063/1.124682
中图分类号
O59 [应用物理学];
学科分类号
摘要
An electrostatic force microscope was used to write and image localized dots of charge in a double barrier CeO2/Si/CeO2/Si(111) structure. By applying a relatively large tip voltage and reducing the tip to sample separation to 3-5 nm, charge dots 60-200 nm full width at half maximum of both positive and negative charge have been written. The total stored charge is found to be Q=+/-(20-200)e per charge dot. These dots of charge are shown to be stable over periods of time greater than 24 h, with an initial charge decay time constant of tau similar to 9.5 h followed by a period of much slower decay with tau > 24 h. The dependence of dot size and total stored charge on various writing parameters such as tip writing bias, tip to sample separation, and write time is examined. (C) 1999 American Institute of Physics. [S0003-6951(99)04035-8].
引用
收藏
页码:1326 / 1328
页数:3
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