Interferometric characterization of growth dynamics during dendritic electrodeposition of zinc

被引:48
作者
Argoul, F [1 ]
Freysz, E [1 ]
Kuhn, A [1 ]
Leger, C [1 ]
Potin, L [1 ]
机构
[1] UNIV BORDEAUX 1,CTR PHYS MOLEC OPT & HERTZIENNE,F-33405 TALENCE,FRANCE
来源
PHYSICAL REVIEW E | 1996年 / 53卷 / 02期
关键词
D O I
10.1103/PhysRevE.53.1777
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
We propose a dynamical interferometric analysis of the electrodeposition of zinc in thin gap cells without supporting electrolyte. The emphasis is made on the dendritic regime, which is observed under high current conditions. We show that the growth process can be split into four different stages: a fast polarization of the interface, a two-step depletion regime where the metallic interface encounters two successive destabilizations, and a large field screening regime leading to few dendrites.
引用
收藏
页码:1777 / 1788
页数:12
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