Preparation of TiO2 films by CVD method and its electrical, structural and optical properties

被引：67

作者：

Bessergenev, VG

Khmelinskii, IV

Pereira, RJF

Krisuk, VV

Turgambaeva, AE

Igumenov, IK

机构：

[1] Univ Algarve, P-8000 Faro, Portugal

[2] Russian Acad Sci, Inst Inorgan Chem, Novosibirsk 630090, Russia

来源：

VACUUM | 2002年 / 64卷 / 3-4期

关键词：

thin films; chemical vapour deposition; photocatalysis;

D O I：

10.1016/S0042-207X(01)00318-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The study of thermal behaviour of Ti(dpm)(2)(OPri)(2) used as a source compound to obtain TiO2 films was carried out. Data on vapour composition, thermal stability and decomposition products of the compound in vacuo were obtained. The scheme of thermal decomposition of vapour on hot surface is suggested. Photocatalytic TiO2 films on glass and quartz substrates were obtained by chemical vapour deposition in a standard vacuum apparatus at 1.2-2.0 x 10(-4) mbar. The substrate temperature was stabilised at 450-600degreesC. The growth rate varied from 1-3 nm/min to 20-30 nm/min. (C) 2002 Elsevier Science Ltd. All rights reserved.

引用

页码：275 / 279

页数：5

共 13 条

[1] Synthesis of Ti(DPM)(2)(OCH3)(2) and evaluation of the TiO2 films prepared by metal-organic chemical vapor deposition [J].